CEA - LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'électronique des technologies de l'information

LETI logo CEA-LETI has been involved in numerous European projects in the field of lithography as project leader, WP leader or partner (More Moore, MD3, Magic, Pullnano, Lens and more recently in the EXCEL project PLACYD focused on the deployment of DSA material for semiconductor applications). Its lithography expertise covers standard 193 nm optical lithography using multi patterning strategies, mask-less lithography (ML2), DSA and nano-imprint. CEA-LETI has built a strong background on DSA first on the European project LENS followed by the Magnifico and the recent PLACYD projects. Its state of the art 200 / 300 mm clean room is the basis for the development of advanced processes, metrology and characterization techniques. Furthermore its strong partnership with the block copolymer material provider, ARKEMA, will directly allow the development of adapted technological solutions that will ensure the success of the IONS4SET project.

Please, visit our websites:
- Instituts Carnot

Contact: Guido Rademaker, email:

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